| 摘要 |
PURPOSE:To obtain the mask film inspecting and correcting device which projects and displays a defect of a pattern formed on a mask film to the mask film, and can execute exactly and easily a correction work of this defect. CONSTITUTION:The device is provided with a means (inspecting machine) A for detecting a defect of a pattern formed on a mask film MF, and making a magnetic film in which defect information is recorded, and a means (correcting machine) B for projecting and displaying a defect position of the mask film, based on the defect information recorded in the made magnetic film. In the correcting machine B, the defect information recorded in the magnetic film is read by a reader 600, a liquid crystal driving part 700 drives a liquid crystal and forms a defect display mark as a pattern, and this pattern is projected on the mask film by a projection optical system 200, by which a defect can be found out easily. |
