摘要 |
<p>PURPOSE:To obtain the liquid crystal display device which has the good controllability of the boundaries between respective layers and does not generate the element defect by disconnection by constituting a MIM element by successively providing a transparent electrode layer, an insulator layer and an upper metallic layer on a substrate. CONSTITUTION:The MIM element to be used for the liquid crystal display device is provided with pixel electrodes 15 consisting of the transparent electrode layer, the insulator layer 21 and the upper electrode layer 22 on the substrate 12. Namely, the transparent electrode layer, characteristic indium oxide tin, is formed by a sputtering method as the metallic layer of the lower layer of the MIM element on the substrate 12 consisting of glass and is etched to pattern the pixel electrodes 15. The cleaning of the pixel electrodes 15 is executed and silicon nitride which is the insulator layer 21 is formed by a reactive sputtering method right thereafter; further, molybdenum which is the upper electrode layer 22 is formed as the metallic layer of the upper layer of the MIM element continuously with the insulator layer 21 by the sputtering method.</p> |