| 摘要 |
PURPOSE:To efficiently remove applied solution spread on a rear face of solution applied on a glass substrate or the like. CONSTITUTION:During normal rotation of a spin chuck 13, cleaning fluid is jetted only from a first nozzle 14a, while no cleaning fluid S is jetted from a second nozzle 14b, so that a downstream part with a rotating direction as reference (where the cleaning fluid is likely to accumulate) is intensely cleaned among sides of a plate-like object W to be treated. Then the spin chuck 13 is reversely rotated and the cleaning fluid is now jetted only from the second nozzle 14b, so that a downstream part with the rotation direction as reference is intensely cleaned among the sides of the plate-like object W to be treated. |
