发明名称 DEFECT INSPECTING AND CORRECTING DEVICE FOR MASK FILM
摘要 PURPOSE:To exactly and easily execute a correction work of a defect by detecting a defect of a pattern formed on a mask film, and projecting and displaying a defect position based on this defect information. CONSTITUTION:Between a film loading part 5A and a film unloading part 5B, a defect inspecting part 6 for reading an image of a pattern of a mask film MF loaded on an inspection table 4 and inspecting a defect is provided. Also, by an illumination light source 61 such as a fluorescent lamp, etc., provided in the lower side than the inspection table 4 in a middle position of a base plate 1, the mask film MF on the inspection table is allowed to transmit through and illuminated. Moreover, a film carrier 72 is reciprocated along a film carrying guide 62, and a microfilm sucked to a film suction nozzle 73 is tuck to a prescribed part of the mask film MF. In this microfilm, a detected defect display can be converted to a developed image in the part corresponding to the pattern defect of the mask film MF detected by the defect inspecting part 6.
申请公布号 JPH05341491(A) 申请公布日期 1993.12.24
申请号 JP19920170106 申请日期 1992.06.04
申请人 ASAHI OPTICAL CO LTD 发明人 ONO HIDEAKI;SUZUKI SHINICHI
分类号 G03F1/00 主分类号 G03F1/00
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