| 摘要 |
PURPOSE:To obtain the mask film inspecting device which projects and displays a defect of a pattern formed on a mask film to the mask film, and can execute exactly and easily a correction work of this defect. CONSTITUTION:The device is provided with a means (inspection machine A, defect information storage part 600) for detecting a defect of a pattern formed on a mask film MF, and storing detected defect information, and a means (correcting machine B, liquid crystal, projection optical system 200) for displaying a defect position of the mask film, based on the stored defect information. For instance, in the correcting machine B, based on the stored defect information, a mark for displaying a defect position is displayed by a liquid crystal, and this defect display mark displayed by the liquid crystal is projected and displayed to the mask film, by which a defect in the mask film can be corrected easily. |
