| 摘要 |
<p>PURPOSE:To separate a substrate to be exposed from a mask by a much smaller driving force in a table apparatus for placing the substrate to be exposed for a contact type or proximity type exposure unit for transferring a pattern of a mask formed with a predetermined pattern to the substrate to be exposed. CONSTITUTION:A holding base 7 for placing a substrate 20 to be exposed is so inclined as to separate it gradually from its one end from a mask 21, thereby separating the substrate 20 to be exposed from the mask 21 by a much smaller force.</p> |
