| 发明名称 |
|
| 摘要 |
An apparatus and process for determining focus correction for a lithographic tool are provided. A periodic surface relief structure containing focus information is illuminated so that diffraction beams are generated. An object is translated orthogonally to the periodic structure to cause a change in the intensity of the diffracted beams. Focus correction is determined based upon the changes in the intensity of the diffracted beams. |
| 申请公布号 |
JPH0588835(B2) |
申请公布日期 |
1993.12.24 |
| 申请号 |
JP19860015981 |
申请日期 |
1986.01.29 |
| 申请人 |
INTAANASHONARU BIJINESU MASHIINZU CORP |
发明人 |
ANSONII JURIANA JUNIA;MIRUTON RATSUSERU RATSUTA;GUREN TAUAANIA SHINSABOTSUKUSU;KAARUTON GURANDO UIRUSON |
| 分类号 |
H01L21/30;G01B11/00;G03F7/207;G03F9/00;H01L21/027;H01L21/67;H01L21/68;(IPC1-7):G03F7/207 |
主分类号 |
H01L21/30 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
