| 摘要 |
PURPOSE:To expose an alignment mark onto a wafer without causing a misalignment and crushing, and to enhance the alignment accuracy. CONSTITUTION:In the reticle for a stepper, by arranging protective patterns 10, 11 in an alignment mark 4 arranged in a scribe line area 3 in the periphery of a main body chip area 1, the alignment mark 4 can be arranged in the scribe line area 3 in the periphery of the main body chip area 1, and the protective patterns 10, 11 are provided, by which at the time of exposure, the alignment mark is not crushed, a throughput of a design of the reticle for the stepper is improved, the alignment accuracy is improved, and the improvement of the non-defective unit yield can be realized. |
