发明名称 METHOD FOR REFORMING SURFACE OF INORGANIC COAT FILM
摘要 PURPOSE:To reform the surface conditions of an inorganic coat film by reacting a specified gas silane compound with the inorganic coat film followed by graft polymerization with a material having aftertreatment or unsaturated bonding. CONSTITUTION:A gas silane compound having either one of a substituent or unsaturated bonding as being covered into a hydrophilic group by aftertreatment is reacted with an inorganic coat film having a layer mainly containing SiO2 as a surface layer in vacuum or in the atmosphere. A material having aftertreatment or unsaturated bonding is successively graft-polymerized with it. By reacting the silane compound with the inorganic coat film and giving hydrophilic property by the aftertreatment, in this way, whereby the characteristics of the inorganic coat film and the surface are changed, and film characteristics such as clouding prevention and charge prevention are improved. Further, the use of a diluting solvent for film thickness regulation and a washing solvent (for example, fluorocarbon) to react the gas silane compound is not required.
申请公布号 JPH05341108(A) 申请公布日期 1993.12.24
申请号 JP19930007903 申请日期 1993.01.20
申请人 SEIKO EPSON CORP 发明人 OKANOE ETSUO;NAKAJIMA MIKITO;MOGAMI TAKAO
分类号 G02B1/10 主分类号 G02B1/10
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