| 摘要 |
PURPOSE:To provide the process for production of the phase shift mask which prevents the damage of a ground surface substrate at the time of working the phase shifter and has good mechanical strength and the adhesiveness to a ground surface material. CONSTITUTION:Mask patterns 2 which have light shielding parts and light transparent parts and have a prescribed pattern shape are formed on a mask substrate 1 which allows the transmission of light. An etching stopper film 4 which allows the transmission of light so as to cover the entire surface of the mask substrate 1 and the mask patterns 2 is then formed. Further, an SOG film 3 is formed atop the etching stopper film. The SOG film 3 is then so patterned that the film remains at the prescribed points including the light transparent parts 2b. The damage of the mask substrate 12 by an etching agent at the time of forming the phase shifter is thereby prevented. The SOG film 3 having the excellent mechanical strength and the adhesiveness to the ground surface material is used as the phase shifter material. |
