| 摘要 |
PURPOSE:To form a fine pattern high in sensitivity and resolution to short wavelength ultraviolet rays, electron beams, X rays, and other active radiation. CONSTITUTION:This negative pattern-forming material comprises an alkali- soluble resin, a compound having a double bond capable of cationic polymerization, and a cationic polymerization initiator precursor and it can transfer a pattern by using short wavelength ultraviolet rays, electron beams, or other active radiation, thus permitting this composition to have excellent sensitivity to active radiation and to form a pattern with high sensitivity. |
