发明名称 |
METHOD FOR DRYING PHOTOSENSITIVE COATING FILM |
摘要 |
PURPOSE:To provide a method for drying photosensitive coating film without causing development of unevenness so as to enhance the quality of the film. CONSTITUTION:A method for drying a photosensitive coating film comprising a step that a substrate to be processed is coated with photosensitive organic material dissolved in solvent a step that the solvent is dried and a step that after the drying the selective exposure and the development are successively applied to the photosensitive material to form a pattern made of organic material on the substrate, wherein after the substrate coated with the photosensitive organic material is placed on a plate made of material having a large thermal capacity, this plate is put on an oven and is then heated. |
申请公布号 |
JPH05343311(A) |
申请公布日期 |
1993.12.24 |
申请号 |
JP19920151025 |
申请日期 |
1992.06.11 |
申请人 |
FUJITSU LTD |
发明人 |
TANI MOTOAKI;SASAKI MAKOTO;MIYAHARA SHOICHI;ITO TAKASHI;HORIKOSHI EIJI |
分类号 |
G03D15/02;G03F7/16;G03F7/38;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G03D15/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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