| 摘要 |
<p>An apparatus and method for etching a point on the surface of a magnetic medium to reduce the reflectivity of the point and for verifying that proper etching occured. A light source (40) provides a collimated incident beam of light (42). The incident beam is focused to a point on the medium (57) and a portion of the beam is reflected. The reflected beam (67) is separated from the incident beam and the intensity is compared to a threshold value and verification is indicated if the measured intensity exceeds the threshold value.</p> |
