发明名称 SURFACE MEASURING INSTRUMENT
摘要 PURPOSE:To accurately and quickly position a probe by focusing an optical system observing means on a sample and a probe without moving the observing means or probe in the vertical direction by putting a refracting means which varies the focus between the optical system observing means and sample. CONSTITUTION:The position of a sample 14 is set in advance so that the sample 14 can be focused on the upper surface of a probe 18 by means of an X-Y-Z stage 12 by positioning the probe 18 in the luminous flux of an objective lens 15a. Then an inserting plate 21 is positioned in the luminous flux of the lens 15a by moving the plate 21 by means of a finely moving mechanism 19 for inserting plate and, when the focal distance of the plate 21 becomes longer, the sample 14 is focused. In other words, the thickness of the plate 21 is set. In such a state, a target point is searched by moving the sample 14 by means of another X-Y-Z stage 13. After searching, the plate 21 is moved out of the luminous flux and the probe 18 is moved to the target point on the sample 14 by means of a finely moving mechanism 16 for probe. Since an objective lens 12a is focused on the probe 18 in a state where the plate 21 does not exist, the probe 18 can be easily positioned to the target point on the sample 14, namely, to the center of the optical axis.
申请公布号 JPH05340713(A) 申请公布日期 1993.12.21
申请号 JP19920153772 申请日期 1992.06.12
申请人 FUJITSU LTD 发明人 FUJII AKIRA;OZAKI KAZUYUKI;WAKANA SHINICHI
分类号 G01B7/34;G01Q10/02;G01Q30/02;G02B7/28;G02B21/00;(IPC1-7):G01B7/34 主分类号 G01B7/34
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