发明名称 Photolithographic masking process
摘要 A semiconductor wafer 11 is mounted on an elongated member 18, one end of which is rotatable about a transverse axis (14), thereby to distribute a liquid on the upper surface of the wafer more evenly. In order to stabilize the rotation of the elongated member, a second elongated member is preferably attached end-to-end to the elongated member (18) and rotates with it. A counterweight (26) in the second elongated member moves during the rotation such that the distance between the wafer and the central axis and the distance between the center of the counterweight and the axis are substantially equal. The weight distribution is approximately symmetrical about the axis and the structure is dynamically stabilized. The counterweight and the wafer assembly may be moved during rotation by applying air pressure from a source (23) to pistons (13, 26) in the two elongated members.
申请公布号 US5272118(A) 申请公布日期 1993.12.21
申请号 US19920983195 申请日期 1992.11.30
申请人 AT&T BELL LABORATORIES 发明人 ZIGER, DAVID H.
分类号 B05C11/08;G03F7/16;(IPC1-7):H01L21/469 主分类号 B05C11/08
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