Laminate material and its use as heat-sink

摘要

The laminate material comprises a sintered silicon carbide substrate (S) on which there is deposited by CVD a diamond layer in an enclosure (1) fed with 1% methane in hydrogen through a conduit (13), this gas mixture being activated by a hot tantalum filament raised to 2000 DEG C. This layer is thereafter covered, in another enclosure, with an AlN layer formed from a mixture of H2+2% AlCl3 reacting with a mixture of H2+1% NH3.