发明名称 POLISHING METHOD AND POLISHING DEVICE
摘要 PURPOSE:To restrain occurrence of scratches in a polishing method in which fluid is fed onto a surface to be polished of a workpiece in several directions so as to polish the same, by allowing one of fluid to flow so as to catch up the other fluid, by feeding abrasive into one of the fluids. CONSTITUTION:A gas supply means include a nozzle 5 having a slit-like cross- sectional shape, for vertically supplying gas, and a nozzle 6 adapted to feed abrasive, for horizontally supplying gas. The nozzle 5 is laid, substantially perpendicular to the surface of a glass pane as a workpiece, and the nozzle 6 is laid so that gas flows in a substantially horizontal direction, near to the nozzle 5. Accordingly, a fluid catch-up stream is likely to occur. Thus, when compressed air is jetted from the nozzle 5, pressure reduction occurs between the nozzle 5 and the workpiece 7 which is therefore sucked up toward the front end side of the nozzle 5, and further, the swirling stream catches up the abrasive which is therefore caused to efficiently impinge upon a surface to be polished of the workpiece, thereby it is possible to enhance the polishing efficiency.
申请公布号 JPH05337819(A) 申请公布日期 1993.12.21
申请号 JP19920163990 申请日期 1992.05.29
申请人 ASAHI GLASS CO LTD 发明人 HOTTA NAOHIRO
分类号 B24B37/00;B24B37/04;B24B57/02 主分类号 B24B37/00
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