发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF
摘要 PURPOSE:To reduce the number of processes after receiving ROM data from the user in the manufacture of a semiconductor device and thereby enable the acceleration of delivery. CONSTITUTION:Gate insulating films 3 are formed on a substrate 1. Two gate electrodes 4, away from each other, are formed on the gate insulating films 3. A diffusion layer 5 of a conductivity type opposite to that of the substrate 1 is formed therein; the diffusion layers 5 are formed under respective gate electrodes 4 and are away from each other, accordingly.
申请公布号 JPH05335522(A) 申请公布日期 1993.12.17
申请号 JP19920141275 申请日期 1992.06.02
申请人 FUJITSU LTD 发明人 AKIBA TOSHIHIKO
分类号 H01L27/112;H01L21/8246 主分类号 H01L27/112
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