| 摘要 |
PURPOSE:To improve the 'wettability' on the surface of a transparent substrate and to suppress the generation of white defects by the repelling of colored layers by subjecting the surface of the transparent substrate to a silane treatment. CONSTITUTION:After, for example, a Cr film is formed on the transparent substrate 1, the unnecessary parts thereof are etched away to form a light shielding layer 2 in prescribed patterns. The transparent substrate 1 is then subjected to the silane treatment so as to cover the light shielding layer 2. Namely, the transparent substrate 1 is immersed into an aq. soln. of 0.2wt.% aminosilane or the aq. soln. of the aminosilane is sprayed by a shower to the surface of the transparent substrate 1 and thereafter, the substrate is lightly rinsed with pure water. This transparent substrate 1 is placed for 10 minutes in an air atmosphere kept at 120 deg.C, by which aminosilane films 7 of mol-P-order are formed on the transparent substrate 1 and the light shielding layer 2. The colored layers 3a, 3b, 3c of R, G, B are formed in prescribed patterns on the aminosilane films 7. Then, the generation of the white defects by the repelling, etc., is prevented at the time of forming the colored layers consisting of org. materials. |
