Verfahren zur Messung des Sauerstoffsgehaltes in Silizium.

摘要

Disclosed is a method of measuring the quantity of oxygen contained in a silicon sample comprising (i) heating at first a double graphite crucible (C) consisting of an outside graphite crucible (9) of which the temperature is directly controlled by electrifying to generate heat and an inside graphite crucible (10) provided in said outside graphite crucible of which the temperature is indirectly controlled at a predetermined high temperature to degas said double graphite crucible itself; (ii) adjusting the temperature of said double graphite crucible at a predetermined value and charging a flux metal (M) into said inside graphite crucible to degas said flux metal; (iii) ajusting the temperature of said double graphite crucible at values near the melting point of silicon and charging a silicon sample (S) into said inside graphite crucible to melt said silicon sample in the flux metal and then adjusting the temperature of said double graphite crucible at values which are relatively higher than the melting point of the silicon to extract oxygen contained in said silicon sample in form of gases combined with carbon; and (iv) introducing said extracted gases into a gas-concentration analyzing system to detect the gas concentration, whereby measuring the quantity of oxygen contained in said silicon sample. n