发明名称 PATTERN DESIGNING DEVICE FOR SEMICONDUCTOR INTEGRATED CIRCUIT
摘要 <p>PURPOSE:To obtain a semiconductor integrated circuit pattern designing device with which the recognition of pattern structure is promoted when the semiconductor integrated circuit is designed and working efficiency is improved. CONSTITUTION:By providing a menu means 20 to be used to designate the cross-sectional structure of an arbitrary pattern, a cross-sectional structure memory storage 3 having the recognition function and the memory function of the cross-sectional structure of the designated pattern, and a display means 1 for displaying the plan view diagram 11 such as mask data and the like and the cross sectional structure, a cross-sectional diagram 12 corresponding to the plain diagram 11' can be displayed.</p>
申请公布号 JPH05326710(A) 申请公布日期 1993.12.10
申请号 JP19920132256 申请日期 1992.05.25
申请人 MITSUBISHI ELECTRIC CORP 发明人 OOMORI ASAMI
分类号 G06F3/14;G06F3/048;G06F17/50;H01L21/3205;H01L21/82;H01L23/52;(IPC1-7):H01L21/82;H01L21/320;G06F15/60 主分类号 G06F3/14
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