| 摘要 |
PURPOSE:To draw a fine pattern at high contrast by a method wherein the traveling operation of at least one part of the outer circumferential part of a laser beam is stopped by means of a filter installed on the light path of each laser beam and the edge contrast of a drawing beam is increased. CONSTITUTION:A laser beam 2 from an argon-laser-beam generation device 1 is changed to eight laser beam 4 by means of a beam splitter 3. The cross-sectional shape of the laser beams is processes by means of a filter part 20 which is provided with a required opening shape. After that, the beams are modulated by means of an acoustooptical modulator 5; they are reflected by a steering mirror 6; they are passes through a zoom part 7, a polygon mirror 8, an f-gamma lens 9, an image splitter 10 and an object lens 11; a photoplate 16 for reticle formation use on an X-Y stage is irradiated with them; prescribed patterns 17 are drawn. Thereby, it is possible to ensure a sufficient contrast at edge parts of the adjacent patterns and to form the patterns whose resolution is high and whose size is stable. |
