| 摘要 |
<p>PURPOSE:To provide a liquid crystal display with a high throughput in a productive step, by patterning a transparent substrate together with a metallic film, an insulating film and a photosensitive resin film formed successively thereon, etching the insulating film and the metallic film, removing the photosensitive resin film, and carrying out a patterning step for a second insulating film formed thereon. CONSTITUTION:After an aluminum-based alloy layer 1 is formed on a glass substrate 11 in a spattering method, a spattering silicon oxide film 2 is formed thereon, and a patterning step is carried out with a photoresist 3. The oxide film 2 is etched in plasma with a gas mainly made of fluorine-based materials, and the alloy layer 1 is etched in plasma with a chlorine-based gas. Then, the resist is removed to form a metallic pattern having a first insulating layer, and a silicon nitride film 4 is formed and is etched in plasma to remove the photoresist. Consequently, the number of defects caused by a short circuit between layers can be reduced.</p> |
