| 摘要 |
PURPOSE:To accurately form a rectangular hole in such a way that its corner parts are not rounded and to reduce the production process in the formation method of a fine contact hole. CONSTITUTION:A negative-type photoresist layer 3 on an object 2 to be etched is exposed to light in two exposure processes by using masks 4, 8 in which linear light-shielding films 5, 5 are crossed with each other. After that, it is developed. After that, the object 2 to be etched is etched by making use of the negative-type photoresist layer 3 as a mask. |
