THIN-FILM SEMICONDUCTOR DEVICE, ITS MANUFACTURE, AND LIQUID CRYSTAL DISPLAY USING THIN-FILM SEMICONDUCTOR DEVICE

摘要

PURPOSE:To prevent a deterioration in characteristics and a decrease in productive yield even for a substrate made of a high polymer material (a plastic film) in a semiconductor device. CONSTITUTION:A substrate 11 made of a high polymer material (a plastic film) has a projected and recessed part 14 on its surface 12, and a semiconductor device 13 (e.g. a thin-film transistor) is formed on this surface 12. Then, the surface 12 of the substrate 11 can be processed in a laser abrasion method, in which a thermal process factor becomes negligible. Consequently, only an irradiated part with a laser beam can be instantaneously etched at low temperatures without damaging the other surrounding part thereof, and the depth of etching is controlled with high accuracy.