| 摘要 |
PURPOSE:To provide a developing apparatus wherein a developing residue is hard to cause and a defect is hard to cause in a developing operation. CONSTITUTION:A glass substrate 10 is carried into a developingsolution coating chamber 12 from a conveyance roller 15. The liquid surface of a developing solution 20 is held to be higher than the conveyance face of the glass substrate 10. Thereby, since bubbles generated inside the developing solution 20 rise to the direction of the liquid surface, it is possible to prevent that the bubbles adhere to the glass substrate 18 which is conveyed in the developing solution 20. The glass substrate 10 is carried out to a conveyance roller 16 from the developing-solution coating chamber 12. The developing solution 20 with which the surface of the glass substrate 10 has been coated is not spilt thanks to surface, and a developing operation progresses. Since the developing solution 20 on the rear of the glass substrate 10 which has been passed through the developing-solution coating chamber 12 is inessential, it is stripped off by means of a brush 28, and the amount consumed of the developing solution 20 is suppressed. Since a resist is not dissolved inside the developing-solution coating chamber 12, the developing solution is not contaminated. Even when the solution is circulated and reused, its reproducibility is good. |
