发明名称 |
METHOD OF FORMING OXIDE PASSIVATION FILM AT WELD PORTION AND PROCESS APPARATUS |
摘要 |
This invention provides a welding method capable of forming an oxide passivation film having corrosion resistance and an extremely small emission quantity of an outgas during welding at a weld portion and portions nearby, and a process apparatus requiring an ultrahigh-clean atmosphere. A back-seal gas comprising an inert gas contaning 1 ppb to 50 ppm of oxygen gas in caused to flow during a welding process and an oxide passivation film comprising chromium oxide as a principal component is formed on the surface of a weld portion. In a process apparatus using welding for installing the apparatus, a back-seal gas comprising an inert gas containing 1 ppb to 50 ppm of oxygen gas is caused to flow during a welding process and an oxide passivation film comprising chromium oxide as a principal component is formed on the surface of a weld portion. |
申请公布号 |
WO9324267(A1) |
申请公布日期 |
1993.12.09 |
申请号 |
WO1993JP00720 |
申请日期 |
1993.05.28 |
申请人 |
OSAKA SANSO KOGYO LTD.;OHMI, TADAHIRO |
发明人 |
OHMI, TADAHIRO;NAKAMURA, MASAKAZU |
分类号 |
B23K9/00;B23K9/035;B23K35/38;C23C8/10;C23C8/18;(IPC1-7):B23K9/00;C23C8/14;B23K9/16 |
主分类号 |
B23K9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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