COMPOSITION FOR FORMING ANTI-REFLECTION FILM ON RESIST AND PATTERN FORMATION METHOD

摘要

The title composition is an aqueous solution of a fluoric compound. The method comprises the steps of coating a photoresist composition on a substrate; coating the anti-reflection film composition; exposing the coated film to form a pattern; and developing the photoresist. Since the composition in the form of an aqueous solution is coated on the photoresist, not only the anti-reflection film can be formed easily, but also, the film can be removed easily by rinsing or alkali development. Therefore, by this pattern formation method, it is possible to form a pattern easily with a high dimensional accuracy.