发明名称 PHOTOMASK
摘要 PURPOSE:To prevent an unnecessary pattern formed on a boundary between the bare surface of a substrate (light transmissive portion) and the phase shift portion from being transferred to a light sensitive substrate. CONSTITUTION:For a glass substrate 1 on which a circuit pattern consisting of the shade portion 3 and the first phase shift portion 4 is formed in a pattern- formed area PA, the second phase shift portion 5 of almost uniform thickness is formed on the pattern-formed face in such a manner that an area where the second phase shift portion 5 is formed is defined to be wider than an area PA where the circuit pattern is formed. In this way, it is impossible that an unnecessary pattern is formed on a boundary between the phase shift portions, if positive resist is used.
申请公布号 JPH05323567(A) 申请公布日期 1993.12.07
申请号 JP19920128369 申请日期 1992.05.21
申请人 NIKON CORP 发明人 SAKASAI SHIGEO
分类号 G03F1/30;G03F1/68;H01L21/027 主分类号 G03F1/30
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