发明名称 CLEANZING METHOD FOR SURFACE OF SUBSTRATE
摘要 PURPOSE:To obtain a clean surface without adhesion of particles by forming a polymer coating on a substrate having a smooth surface and separating the polymer coating. CONSTITUTION:A polymer coating is formed on a substrate and then the particles adhering to the coating are removed. The substrate capable of being cleanzed is a substrate having a smooth surface without such surface irregularity to obstruct the separation of the coating, for example, a silicon wafer, mask blanks, a substrate with a metal thin film formed on the surface, a metal plate, a glass plate, a plastic plate and the like. And a polymer coating is formed by using a polymer solution, and for a polymer in the polymer solution, for example, a pellicle film polymer of polyvinylpropional, nitrocellulose and the like, a bonding agent polymer of polyvinyl acetate, polyvinyl chloride and the like, a copolymer of tetrachloroethylene-vinylidenefluoride and the like are available.
申请公布号 JPH05323579(A) 申请公布日期 1993.12.07
申请号 JP19920147900 申请日期 1992.05.15
申请人 TOSOH CORP 发明人 TANIGUCHI TAKASHI
分类号 B08B11/00;G03F1/82;H01L21/304 主分类号 B08B11/00
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