| 摘要 |
PURPOSE:To advantageously control the fluctuation of impressed voltage in etching in the production process for forming a linear groove, etc., on the surface of a steel sheet by electrolytic etching by controlling the impressed voltage and the distance between the steel sheet and electrode in etching. CONSTITUTION:An etching mask is selectively formed on the surface of a silicon steel sheet which has been cold-rolled to the final thickness. The silicon steel sheet 1 is traveled through an electrolytic bath 3 and continuously electrolytically etched by an electrode 4 opposed to the sheet 1 in the bath 3 to locally form a linear or dotted groove on the sheet 1 surface. The fluctuation of the impressed voltage is detected in the electrolytic etching, the electrode 4 is vertically moved by a lift 6 in the direction eliminating the fluctuation, and the electrode-sheet distance is changed. Etching is stably conducted in this way. |
