| 摘要 |
PURPOSE:To facilitate long-time conservation by forming a required-shape mask pattern on the surface of a transparent substrate and forming a silicon transparent film on the upper face of the transparent substrate. CONSTITUTION:A silicon film 13 is formed with spattering on a photo-mask 10 which consists of a transparent substrate made of glass, soda lime glass, silica glass, etc., and a chrome mask pattern 12, and negative photo-resist is applied thereon. Next, light is irradiated from the opposite side of the negative photoresist 14 applied face of the photo-mask 10 to expose the negative photoresist 14 to the light by using the mask pattern 12 as a mask. When the negative photo-resist 14 is developed, the negative photo-resist 14 is removed at the shaded part in other areas than the mask pattern 12 is formed. In addition, the silicon film 13 is given dry etching. As a result, the silicon film 13 is selectively left on the partial surface of the glass substrate 11. |
