发明名称 METHOD FOR TREATING WASTE LIQUID AND DEVICE THEREFOR
摘要 PURPOSE:To adequately perform a decomposition treatment of a harmful substance in the gas which generates when photographic processing waste liquid is heated and evaporated and also to simply, efficiently and economically provide the device compact in size. CONSTITUTION:The mixture gas mixing the gas such as generated ammonia gas with air and is heated 11 is introduced to a catalyst reaction process 13 and is heat-exchanged indirectly for the temperature of the process and then is fed into the catalyst reaction process and the temperature of the mixture gas heated before the heat-exchanging is adjusted so that the temperature of the mixture gas after the heat-exchange becomes the setting temperature, then the reaction temperature of the catalyst reaction process 13 is controlled.
申请公布号 JPH05317844(A) 申请公布日期 1993.12.03
申请号 JP19920151186 申请日期 1992.05.20
申请人 OGAWA KANKYO KENKYUSHO:KK 发明人 OGAWA TAKAO
分类号 B01D53/86;C02F1/04;G03C5/00 主分类号 B01D53/86
代理机构 代理人
主权项
地址