发明名称 |
METHOD FOR TREATING WASTE LIQUID AND DEVICE THEREFOR |
摘要 |
PURPOSE:To adequately perform a decomposition treatment of a harmful substance in the gas which generates when photographic processing waste liquid is heated and evaporated and also to simply, efficiently and economically provide the device compact in size. CONSTITUTION:The mixture gas mixing the gas such as generated ammonia gas with air and is heated 11 is introduced to a catalyst reaction process 13 and is heat-exchanged indirectly for the temperature of the process and then is fed into the catalyst reaction process and the temperature of the mixture gas heated before the heat-exchanging is adjusted so that the temperature of the mixture gas after the heat-exchange becomes the setting temperature, then the reaction temperature of the catalyst reaction process 13 is controlled. |
申请公布号 |
JPH05317844(A) |
申请公布日期 |
1993.12.03 |
申请号 |
JP19920151186 |
申请日期 |
1992.05.20 |
申请人 |
OGAWA KANKYO KENKYUSHO:KK |
发明人 |
OGAWA TAKAO |
分类号 |
B01D53/86;C02F1/04;G03C5/00 |
主分类号 |
B01D53/86 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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