发明名称 |
Compound semiconductor device having an emitter contact structure including an InxGa1-xAs graded-composition layer |
摘要 |
A compound semiconductor device wherein a contact to an n type AlxGa1-xAs layer comprises an InxGa1-xAs graded-composition layer, an InxGa1-xAs contact layer having a constant composition and a metal electrode layer, the InxGa1-xAs graded-composition layer is doped with an n type impurity which concentration is higher than a concentration of an impurity activated as n type, whereby, even when a thickness of the InxGa1-xAs graded-composition layer is made sufficiently small, a reduction in the carrier concentration of the thin graded-composition layer causes no increase of its resistance and a low-resistance contact is realized.
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申请公布号 |
US5266818(A) |
申请公布日期 |
1993.11.30 |
申请号 |
US19920852334 |
申请日期 |
1992.03.17 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
TSUDA, KUNIO;MORIZUKA, KOUHEI |
分类号 |
H01L29/205;H01L29/36;H01L29/45;H01L29/737;(IPC1-7):H01L29/161 |
主分类号 |
H01L29/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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