发明名称 Compound semiconductor device having an emitter contact structure including an InxGa1-xAs graded-composition layer
摘要 A compound semiconductor device wherein a contact to an n type AlxGa1-xAs layer comprises an InxGa1-xAs graded-composition layer, an InxGa1-xAs contact layer having a constant composition and a metal electrode layer, the InxGa1-xAs graded-composition layer is doped with an n type impurity which concentration is higher than a concentration of an impurity activated as n type, whereby, even when a thickness of the InxGa1-xAs graded-composition layer is made sufficiently small, a reduction in the carrier concentration of the thin graded-composition layer causes no increase of its resistance and a low-resistance contact is realized.
申请公布号 US5266818(A) 申请公布日期 1993.11.30
申请号 US19920852334 申请日期 1992.03.17
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 TSUDA, KUNIO;MORIZUKA, KOUHEI
分类号 H01L29/205;H01L29/36;H01L29/45;H01L29/737;(IPC1-7):H01L29/161 主分类号 H01L29/205
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