| 摘要 |
The present invention relates to a method of depositing diamond crystals using apparatus of the type conventionally employed in subatmospheric pressure deposition apparatus wherein improved deposition is achieved by employing a substrate such as graphite, related aromatic ring compounds, beryllium oxide, hexagonal boron nitride, molybdenum, silicon, diamond or the like, as well as effecting an increase in the rate of mass transfer, such as by imparting motion to the substrate during deposition. |
