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发明名称
Verfahren zum Herstellen von Fotolackmasken fuer Halbleiterzwecke
摘要
申请公布号
DE1614635(A1)
申请公布日期
1970.03.26
申请号
DE19671614635
申请日期
1967.10.23
申请人
SIEMENS AG
发明人
HENKER,DR.HEINZ
分类号
H01J37/317;H01L21/00
主分类号
H01J37/317
代理机构
代理人
主权项
地址
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