RESIST FILM AND ITS FORMATION METHOD

摘要

PURPOSE:To obtain a resist film which can comply flexibly with various kinds of requests such as the improvement of a drop in a resolution caused by the attenuation of a beam of light for exposure use in the resist film, the improvement of a close contact property with a substrate to be treated and the like. CONSTITUTION:For example, a spinner which is provided with a plurality of nozzles 11 inside the same cup 12 is used. Resists whose composition is different are discharged sequentially from the individual nozzles inside the same sequence. The composition of a resist film is changed sequentially.