| 摘要 |
PURPOSE: To pattern a precursor film and improved film product by irradiating a beam, having intensity sufficient to denature specified portions of the precursor film onto other specified portions thereof on a patterned blocking layer and uncovered portions of this film. CONSTITUTION: This method of patterning a precursor film 10 comprises steps of depositing a blocking layer 18 on this film 10, patterning the blocking layer 18 to leave uncovered portions of the film 10, and irradiating a beam on the patterned blocking layer 18 and uncovered portions of the film 10. The beam energy is sufficiently high to radiatively denature the total thickness of the unmasked portions of the film 10 onto the portions covered with the blocking layer 18 of sufficient thickness to block the irradiated beam from radiatively denaturing the total thickness of the precursor layer.
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