| 摘要 |
PURPOSE:To reduce cost concerning the production of a reticle, which is a problem in the conventional exposing device, and further to facilitate the transfer of consecutive, complicated and unsystematic patterns. CONSTITUTION:A four-layered liquid crystal device 3 is used as the reticle part of an exposing device, and brightness and darkness 6 having a necessary pattern shape is formed on the device 3 and transferred on a sample to be worked 7. In the case of such transfer, the relative position of the device 3 to the sample 7 is optionally changed. |
