| 摘要 |
PURPOSE:To provide a photosensitive compsn. having high sensitivty and high resolution for exposure with short wavelength light such as UV rays, and having high stability through the process of pattern forming. CONSTITUTION:This compsn. consists of an alkali-soluble resin, a compd. having substituents which decompose by acid and produce alkali-soluble groups after decomposition or a compd. having substituents crosslinkable with acid, and a compd. expressed by formula which produces acid by exposure. In the formula, R11 is a univalent org. group or univalent org. group to which at least one group selected from halogen atom, nitro groups and cyano group is introduced, R12, R13 and R14 are independently hydrogen atoms, halogen atoms, nitro groups, cyano groups or univalent org. groups and at least one of themn is a cyano group or nitro group. |
