发明名称 ASSEMBLING METHOD OF SOLID-STATE IMAGING DEVICE
摘要 <p>PURPOSE:To prevent black mark generation due to cutting scrap in the assembling process of a solid-state imaging device, in particular, at the time of dicing, and improve the peeling rate of a surface protecting sheet. CONSTITUTION:A surface protecting sheet 5 is stuck on the surface of a wafer on which a solid-state imaging device is formed, and the wafer is stuck on a sheet 2 for dicing. After dicing, the sheet 2 for dicing is expanded, and the intervals ((a) and (b)) between cut-off chips 4 are ensured as specified values (e.g. 5mm or longer). After that, the surface protecting sheet 5 is exfoliated by using a sheet 3 for peeling.</p>
申请公布号 JPH05315445(A) 申请公布日期 1993.11.26
申请号 JP19920143612 申请日期 1992.05.08
申请人 NEC CORP 发明人 TANIJI YUKIO
分类号 H01L21/301;H01L21/78;H01L27/14;(IPC1-7):H01L21/78 主分类号 H01L21/301
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