| 摘要 |
PURPOSE:To enable half-micron lithography with light in the visible or near UV region. CONSTITUTION:This positive type photosensitive compsn. for producing an integrated circuit contains an alkali-soluble resin and a compd. represented by the formula as a photosensitive agent. In formula, each of R<1> and R<2> is H or alkyl, R<1> and R<2> may bond to each other to form an aliphatic hydrocarbon ring, each of R<3> and R<4> is 4-20C alkyl, cycloalkyl, optionally substd. aryl or optionally substd. aralkyl and each of R<5> and R<6> is H, 1, 2- naphthoquinonediazido-4-sulfonyl or 1, 2-naphthoquinonediazido-5-sulfonyl but R<5> and R<6> are not simultaneously H. |
