发明名称 Method for producing high quality oxide films on substrates
摘要 A method for providing an oxide film of a material on the surface of a substrate using a reactive deposition of the material onto the substrate surface in the presence of a solid or liquid layer of an oxidizing gas. The oxidizing gas is provided on the substrate surface in an amount sufficient to dissipate the latent heat of condensation occurring during deposition as well as creating a favorable oxidizing environment for the material.
申请公布号 US5264394(A) 申请公布日期 1993.11.23
申请号 US19910704097 申请日期 1991.05.22
申请人 ASSOCIATED UNIVERSITIES, INC. 发明人 RUCKMAN, MARK W.;STRONGIN, MYRON;GAO, YONG L.
分类号 H01L21/316;H01L21/473;(IPC1-7):H01L21/302 主分类号 H01L21/316
代理机构 代理人
主权项
地址