发明名称 Composition for photo imaging
摘要 An improved photoimagable cationically polymerizable epoxy based coating material is provided, that is suitable for use on a variety of substrates. The material includes an epoxy resin system consisting essentially of between about 10% and about 80% by weight of a polyol resin which preferably is a condensation product of epichlorohydrin and bisphenol A having a molecular weight of between about 40,000 and 130,000; and between about 35% and 72% by weight of an epoxidized glycidyl ether of a brominated bisphenol A having a softening point of between about 60 DEG C. and about 110 DEG C. and a molecular weight of between about 600 and 2,500. A third resin, either an epoxy cresol novolak or a polyepoxy resin, is also added to the resin system. To this resin system is added about 0.1 to about 15 parts by weight per 100 parts of resin of a cationic photoinitiator capable of initiating polymerization of said epoxidized resin system upon exposure to actinic radiation; the system being further characterized by having an absorbance of light in the 330 to 700 nm region of less than 0.1 for a 2.0 mil thick film. Optionally a photosensitizer such as perylene and its derivatives or anthracene and its derivatives may be added.
申请公布号 US5264325(A) 申请公布日期 1993.11.23
申请号 US19920918304 申请日期 1992.07.21
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 ALLEN, ROBERT D.;DAY, RICHARD A.;GLATZEL, DONALD H.;HINSBERG, WILLIAM D.;MERTZ, JOHN R.;RUSSELL, DAVID J.;WALLRAFF, GREGORY M.
分类号 G03F7/038;G03F7/20;H05K3/00;H05K3/28;(IPC1-7):D04H1/08 主分类号 G03F7/038
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