| 摘要 |
PURPOSE:To provide an abrasive material and a polishing method capable of polishing a substance to polish which has minute recesses such as minute grooves, minute holes, and minute hollows, in a relatively short time. CONSTITUTION:To obtain an abrasive for polishing minute parts, an abrasive including ceramics minute beads with the diameter less than 0.5mm, an other natural and/or artificial abrasive material, and the water and/or other liquids when necessary, are included. And to obtain a polishing method for munite parts, the above abrasive material for polishing minute parts and a substance to polish are mixed, and a kinetic force is given to the mixture so as to polish such a substance. |
