发明名称 Simplified method for direct electroplating of dielectric substrates
摘要 Improved methods for electroplating non-conducting substrates are disclosed utilizing aqueous saline adhesion promoter solutions and rinse solutions to enhance the surface deposition of colloidal metal activating catalysts to form conducting layers capable of direct electroplating. One variation of the process recycles excess activating catalyst into the aqueous saline adhesion promoter to eliminate waste.
申请公布号 US5262042(A) 申请公布日期 1993.11.16
申请号 US19910806875 申请日期 1991.12.12
申请人 HARNDEN, ERIC F. 发明人 OKABAYASHI, KIYOSHI
分类号 C25D5/54;H05K3/18;H05K3/42;(IPC1-7):C25D5/54 主分类号 C25D5/54
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