| 摘要 |
<p>PURPOSE:To prevent a light exposure device from deviating in focal point due to the effect of foreign objects attached to a semiconductor substrate in transfer in a transfer system which comprises a photoresist application process to a light exposure process by a method wherein a recess is provided to spots on the front side of a stage correspondent to parts where the rear side of the semiconductor substrate comes into contact. CONSTITUTION:Photoresist is applied onto the front side of a semiconductor substrate 11, and the substrate 11 is transferred and placed on a stage 1, and even if a foreign object 12 is attached to a contact area of the rear side of the substrate with the stage 1, the object 12 is buried into a recess 5 provided to the surface of the stage 1. In result, when a vacuum pump is made to start operating to suck in ambient atmosphere through a vacuum suction hole 3 to bring the semiconductor substrate 11 into close contact with the stage 1, the surface of the semiconductor substrate 11 is kept smooth. Therefore, the image of a master pattern is prevented from getting out of focus throughout the surface of the substrate, so that a pattern is accurately printed.</p> |
