发明名称 |
Photosensitive resin composition and photosensitive element using the same |
摘要 |
A photosensitive resin composition comprising (A) a polymer obtained by reacting an isocyanate compound having an ethylenic unsaturated group with a polymer which is a reaction product of a tetracarboxylic acid dianhydride and a diamine, and (B) a photoinitiator, can provide a thick film excellent in heat resistant, adhesiveness, flexibility, electrical and mechanical properties, and is particularly suitable for producing a photosensitive element.
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申请公布号 |
US5262277(A) |
申请公布日期 |
1993.11.16 |
申请号 |
US19920824088 |
申请日期 |
1992.01.22 |
申请人 |
HITACHI CHEMICAL COMPANY, INC. |
发明人 |
SATO, KUNIAKI;KOJIMA, YASUNORI;TACHIKI, SHIGEO;KIKUCHI, TOHRU;ISHIMARU, TOSHIAKI;HAYASHI, NOBUYUKI;KOJIMA, MITSUMASA |
分类号 |
C08G69/42;C08G73/10;C08G77/54;G03F7/038;G03F7/075;(IPC1-7):G03C1/725 |
主分类号 |
C08G69/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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