发明名称 Photosensitive resin composition and photosensitive element using the same
摘要 A photosensitive resin composition comprising (A) a polymer obtained by reacting an isocyanate compound having an ethylenic unsaturated group with a polymer which is a reaction product of a tetracarboxylic acid dianhydride and a diamine, and (B) a photoinitiator, can provide a thick film excellent in heat resistant, adhesiveness, flexibility, electrical and mechanical properties, and is particularly suitable for producing a photosensitive element.
申请公布号 US5262277(A) 申请公布日期 1993.11.16
申请号 US19920824088 申请日期 1992.01.22
申请人 HITACHI CHEMICAL COMPANY, INC. 发明人 SATO, KUNIAKI;KOJIMA, YASUNORI;TACHIKI, SHIGEO;KIKUCHI, TOHRU;ISHIMARU, TOSHIAKI;HAYASHI, NOBUYUKI;KOJIMA, MITSUMASA
分类号 C08G69/42;C08G73/10;C08G77/54;G03F7/038;G03F7/075;(IPC1-7):G03C1/725 主分类号 C08G69/42
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