发明名称 EQUIPMENT FOR PATTERN INSPECTION
摘要 PURPOSE:To enable detection of a reverse-lighting defect dot extinguished at the time of full-lighting and lighted at the time of full-extinguishing, together with other disconnection defect dot and short-circuit defect dot, in a dot matrix pattern displayed on a liquid crystal panel. CONSTITUTION:Images of a full-lighted pattern and a full-extinguished pattern generated in a substance to be inspected are picked up by a photoelectric conversion scanner 4 and converted into digital images by an A/D conversion circuit 5, whereby a full- lighted image (f) and a full-extinguished image (g) are obtained. The full-extinguished image (g) is inverted by an inversion circuit 8 and thereby an inverted image (h) is obtained. A comparative image (i) is obtained in a comparison circuit 9 and a smoothed image (j) wherefrom a high-frequency component is removed is obtained in a smoothing circuit 10. This image is converted into binary signals (k) of 0 and 1 in a binarization circuit 11 and a reference pattern (c) of full-lighting and a logical product are obtained in an image cutout circuit 12, whereby an inspection result image (l) is obtained. A minute region is removed in a noise removing circuit 13 and thereby a defect image (m) is obtained. The area and the position are determined in a region extraction circuit 14 and outputted as a defect signal (n). A defect is determined from the position and the area and it is determined by a determination circuit 15 whether a display part is good or bad.
申请公布号 JPH05302898(A) 申请公布日期 1993.11.16
申请号 JP19920052094 申请日期 1992.03.11
申请人 NEC CORP 发明人 HATAKEYAMA YUKIKO
分类号 G01B11/24;G01N21/88;G01N21/93;G06T1/00;G06T7/00;G09F9/00;G09G3/36 主分类号 G01B11/24
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