发明名称 THREE-DIMENSIONAL STRUCTURE FORMING DEVICE AND METHOD
摘要 <p>PURPOSE:To realize a three-dimensional structure forming device which is capable of forming an optional three-dimensional structure through a small number of processes and suitable for forming a functional device which includes semiconductors. CONSTITUTION:A three-dimensional structure forming device which utilizes the light exposure of functional material is provided, where the device is equipped with a liquid crystal shutter 11 which varies in pattern basing on drive signals inputted from outside, an exciting light source which irradiates the liquid crystal shutter 11 with light, a reduction projection lens 13 which dwindles and projects light transmitted through the liquid crystal shutter 11, a fine movement stage 14 which sets a specimen 20 on which resist 20 is applied to a point on a wafer 21 where the lens 13 is focused and finely moves the specimen 20 in the direction of an optical axis, and a control circuit 16 which drives the mask 11 and the stage 15 synchronizing them with each other.</p>
申请公布号 JPH05304073(A) 申请公布日期 1993.11.16
申请号 JP19920109606 申请日期 1992.04.28
申请人 TOSHIBA CORP 发明人 BEPPU TATSURO;HATAGOSHI GENICHI;SEKIMURA MASAYUKI
分类号 G03F1/00;G03F1/68;G03F7/20;H01L21/027;H01L21/30;(IPC1-7):H01L21/027;G03F1/08 主分类号 G03F1/00
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